Fabrication of Highly Oriented .BETA.-FeSi2 by Ion Beam Sputter Deposition.
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چکیده
منابع مشابه
Simulation of Fabrication toward High Quality Thin Films for Robotic Applications by Ionized Cluster Beam Deposition
The most commonly used method for the production of thin films is based on deposition of atoms or molecules onto a solid surface. One of the suitable method is to produce high quality metallic, semiconductor and organic thin film is Ionized cluster beam deposition (ICBD), which are used in electronic, robotic, optical, optoelectronic devices. Many important factors such as cluster size, cluster...
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ژورنال
عنوان ژورنال: SHINKU
سال: 2002
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.45.26